Advertisement

UV Pulsed Laser Desorption from Ag/Al/Sapphire Films: Changes in the Ion Desorption Process for Excitations near the Ag d-Band Threshold

  • H.-S. Kim
  • L. Wiedeman
  • H. Helvajian
Conference paper
Part of the Springer Series in Surface Sciences book series (SSSUR, volume 31)

Abstract

Energetic ion species desorption from Al(200nm)/sapphire, Ag(10nm)/Al(200nm)/sapphire and Al(111) targets has been measured tor 244 and 320 nm laser irradiation. The product kinetic energy distribution (KED) for samples irradiated with 244 nm light, for Ag+ and the impurity species K+ resemble the KED of Al+ desorbed from Al(111) and Al/sapphire (< KE > ≈3–4 eV). However, for resonance excitation (320 nm) of the Ag adlayer, all product KEDs shift to lower energy (< KE > ≤1 eV). These results imply that the excitation which leads to ion KE is not due to a local excitation process.

Keywords

Laser Fluence Plasmon Excitation Kinetic Energy Distribution Surface Plasmon Excitation Laser Electric Field 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    H. Helvajian, and R. Welle, J. Chem. Phys. 91, 2616 (1989).CrossRefADSGoogle Scholar
  2. [2]
    H-S Kim, and H. Helvajian, J. Phys. Chem. 95, 6623 (1991).CrossRefGoogle Scholar
  3. [3]
    L. Wiedeman, and H. Helvajian, J. Appl. Phys. 70, 4513 (1991).CrossRefADSGoogle Scholar
  4. [4]
    H-S Kim, H. Helvajian, “Laser Ablation Mechanisms and Applications,” J. C. Miller, and R. R Haglund, Jr., Eds. (Springer-Verlag, NY, 1991) pg. 87.Google Scholar
  5. [5]
    L. Wiedeman, H-S Kim, and H. Helvajian, Mat. Res. Soc. Symp. Proc. 201, 575 (1991).CrossRefGoogle Scholar
  6. [6]
    H. Ehrenreich, and H. R. Phillip, Phys. Rev. 128, 1622 (1962).CrossRefADSGoogle Scholar
  7. [7]
    E. T. Arakawa, I. Lee, and T. A. Calicott, “Laser Ablation Mechanisms and Applications,” J. C. Miller, and R. R Haglund, Jr., Eds. (Springer-Verlag, NY, 1991) pg. 82.CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1993

Authors and Affiliations

  • H.-S. Kim
    • 1
    • 2
  • L. Wiedeman
    • 1
  • H. Helvajian
    • 1
  1. 1.Mechanics & Materials Technology CenterAerospace CorporationLos AngelesUSA
  2. 2.National Academy of SciencesUSA

Personalised recommendations