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Recent Developments in CAD and CIM for Microsystems

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Part of the book series: Informatik aktuell ((INFORMAT))

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Abstract

The use of computer-aided design (CAD) and associated computer-aided engineering (CAE) in microelectronic design is well developed. CAD tools for design, simulation, and verification are in wide use. (For convenience, all tools, whether used for design, simulation, or verification, will be genetically referred to in this paper as “CAD”.) CAD toolsets have been developed for semi-custom design, for example, with gate arrays, making VLSI truly accessible to a broad range of customers. On the manufacturing side, computer-integrated manufacturing (CIM) tools for scheduling, lot tracking, and process control are routinely used.

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References

  • Boning, D. S., McIlrath, M. B., Penfield, P. L., Jr., and Sachs, E. M. (1992) A general semiconductor process modeling framework, IEEE Trans. on Semiconductor Manufacturing, in press.

    Google Scholar 

  • Buser R., de Rooij, N.F. (1990) CAD for silicon anisotropic etching, IEEE Micro Electro eck. Systems, Napa Valley CA, Feb. 1990, pp. 111–112.

    Google Scholar 

  • Buser, R.A., Crary, S.B., Juma, O.S. (1992) Integration of the Anisotropic-Silicon-Etching Program ASEP within the CAEMEMS CAD/CAE Framework, IEEE Micro Electro Mech. Systems, Travemünd***0229, Germany, February, 1992, pp. 133–138.

    Google Scholar 

  • Crary, S.B., Zhang, Y. (1990) CAEMEMS: An integrated computer-aided engineering workbench for micro-electro-mehanical systems, IEEE Micro Electro Mech. Systems, Napa Valley, CA, Feb., 1990, pp. 113–114.

    Google Scholar 

  • Harris, R.M., Maseeh, F., Senturia, S.D. (1990) Automatic generation of a 3-D solid model of a microfabricated structure, IEEE Worskhop on Solid-State Sensors and Actuators, Hilton Head, SC, June 1990, pp. 36–41.

    Google Scholar 

  • Harris, R.M., Senturia, S.D. (1992) A solution to the mask overlay problem in Microelectromechanical CAD (MEMCAD), IEEE Workshop on Solid-State Sensors and Actuators, Hilton Head, SC, June 1992, in press.

    Google Scholar 

  • Heytens, M.L., Nikhil, R.S. (1989) GESTALT: An expressive database programming system, ACM SIGMOD Record, 18: 54–67.

    Article  Google Scholar 

  • Johnson, B.P., Kim, S., White, J.K., Senturia, S.D. (1991) MEMCAD capacitance calculations for mechanically deformed square diaphragm and beam microstructures, 6th Inf’l. Conf. Solid-State Sensors and Actuators (Transducers ‘91), San Francisco, CA, June 1991, pp. 494–497.

    Google Scholar 

  • Koide, A., Sato, K., Tanaka, S. (1991) Simulation of two-dimensional etch profile of silicon during orientation-dependent anisotropic etching, IEEE Micro Eletro Mech Systems, Nara, Japan, Feb. 1991, pp. 216–220.

    Google Scholar 

  • Koppelman, G. M. (1989) OYSTER: a three-dimensional structural simulator for micromechanical design, Sensors and Actuators 20:179–185.

    Article  Google Scholar 

  • Maseeh, F., Harris, R.M., Senturia, S.D. (1990) A CAD architecture for microelectromechanical systems, IEEE Micro Electro Mech. Systems, Napa Valley, CA, Feb., 1990, p. 44–49.

    Google Scholar 

  • McIlrath, M.B., Boning, D.S. (1990) Integrating semiconductor process design and anufacture using a unified process flow representation, Second Intl. Conf. on CIM, Troy NY, May, 1990.

    Google Scholar 

  • McIlrath, M.B., Troxel, D.E., Heytens, M.L., Penfield, P.L., Jr., Boning, D.S., Jayavant, R. (1992) CAFE — The MIT Computer-Aided Fabrication Environment, IEEE Trans. on Components, Hybrids, and Manufacturing Technology, in press.

    Google Scholar 

  • Nabors, K., White, J.K. (1991) FASTCAP: A multipole-accelerated 3-D capacitance extraction program, IEEE Trans. on CAD, 10:1447–1460.

    Google Scholar 

  • Penfield, P.L., Jr., et. al., (1984) Requirements for computer-aided fabrication, MIT VLSI- Memo No. 84–200, MIT Microsystems Technology Laboratory.

    Google Scholar 

  • Sachs, E., Guo R.-S., Ha, S., Hu A. (1991) Process control for VLSI fabrication, IEEE Trans. Semiconductor Manufacturing, 4:134–144.

    Article  Google Scholar 

  • Senturia, S.D. (1987) Microfabriated structures for the measurement of the mechanical properties and adhesion of thin films, 4th Inf’l. Conf. on Solid-State Sensors and Actuators (Transducers ‘87), Tokyo, June, 1987, pp. 11–16.

    Google Scholar 

  • Senturia, S.D. (1991) Mechanical properties of microelectronic materials: How to handle the process dependences?, 1991 MRS FAll Meeting Abstracts, p. 156; also in Nix, W.D., Bravman, J.C., Arzt, E, Freund, L.B., eds., Thin Films: Stresses and Mechanical Properties III, MRS Symposium Volume 239, in press.

    Google Scholar 

  • Senturia, S.D., Harris, R.M., Johnson, B.P., Kim, S., Nabors, K., Shulman, M.A., and White, J.K. (1992) A computer-aided-design system for Microelectromechanial Systems (MEMCAD), J. Micromechanical Systems, 1:3–13.

    Article  Google Scholar 

  • Séquin, C.H. (1991) Computer simluation of anisotropic crystal etching, 6th Int’l. Conf.Solid-State Sensors and Actuators (Transducers ‘91), San Francisco, June 1991, pp. 801–806.

    Google Scholar 

  • Shulman, M.A., Ramaswamy, M., Heytens, M.L., Senturia, S.D. (1991) An object-oriented material-property database architecture for microelectromechanical CAD, 6th Int’l. Conf.Solid-State Sensors and Actuators (Transducers ‘91), San Francisco, June 1991, pp. 486–489.

    Google Scholar 

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© 1992 Springer-Verlag Berlin Heidelberg

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Sentaria, S.D. (1992). Recent Developments in CAD and CIM for Microsystems. In: Görke, W., Rininsland, H., Syrbe, M. (eds) Information als Produktionsfaktor. Informatik aktuell. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-77810-0_12

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  • DOI: https://doi.org/10.1007/978-3-642-77810-0_12

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-55960-3

  • Online ISBN: 978-3-642-77810-0

  • eBook Packages: Springer Book Archive

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