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Barrier-Properties of All-Niobium Tunnel Junctions

  • G. M. Daalmans
  • O. Eibl
  • L. Bär
Part of the Springer Proceedings in Physics book series (SPPHY, volume 64)

Abstract

The barrier-region of all-niobium tunnel junctions has been imaged by means of high resolution transmission electron microscopy (atomic scale). Amorphous silicon barriers as well as amorphous Al2O3-barriers have been studied. Different behaviour concerning wetting and roughness have been found. Finally the TEM-data are correlated with the transport properties of the barriers.

Keywords

High Resolution Transmission Electron Microscopy Leakage Current Josephson Junction Tunnel Junction Ground Electrode 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 1992

Authors and Affiliations

  • G. M. Daalmans
    • 1
  • O. Eibl
    • 2
  • L. Bär
  1. 1.Siemens Central Research LaboratoriesErlangenFed. Rep. of Germany
  2. 2.Siemens Central Research LaboratoriesMünchenFed. Rep. of Germany

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