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Characterization of YBaCuO Films Deposited by the Sputtering Method Using a Temple-Bell-Type Substrate Holder

  • H. Kajikawa
  • Y. Fukumoto
  • K. Shibutani
  • S. Hayashi
  • K. Ishibashi
  • K. Inoue
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 60)

Abstract

The as-grown YBaCuO films deposited by the off-axis sputtering method using a temple-bell type substrate holder showed a good crystalline quality with a minimum yield value xmin of 0. 9MeV He ions 3.8%. The post-annealing degraded the crystalline quality to increase xmin up to 11.8%, though it improved both the Tc and Jc. It was supposed that the degradation was caused by the re-arrangement of oxygen atoms.

Keywords

Half Width Critical Current Density Crystalline Quality Annealed Film Minimum Yield 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. [1]
    X. X. Xi, G. Linker, O. Meyer and J. Geerk, J. Less-Common Met. 151, 295, 1989.CrossRefGoogle Scholar
  2. [2]
    H. Kajikawa, Y. Fukumoto, K. Shibutani, S. Hayashi, R. Ogawa and Y. Kawate, to be published in Proceedings for ISS’90, 1990.Google Scholar

Copyright information

© Springer-Verlag Berlin, Heidelberg 1992

Authors and Affiliations

  • H. Kajikawa
    • 1
  • Y. Fukumoto
    • 1
  • K. Shibutani
    • 1
  • S. Hayashi
    • 1
  • K. Ishibashi
    • 2
  • K. Inoue
    • 2
  1. 1.Superconducting and Cryogenic Technology CenterKobe Steel, Ltd.KobeJapan
  2. 2.Electronics Research LaboratoryKobe Steel, Ltd.KobeJapan

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