Characterization of YBaCuO Films Deposited by the Sputtering Method Using a Temple-Bell-Type Substrate Holder

  • H. Kajikawa
  • Y. Fukumoto
  • K. Shibutani
  • S. Hayashi
  • K. Ishibashi
  • K. Inoue
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 60)

Abstract

The as-grown YBaCuO films deposited by the off-axis sputtering method using a temple-bell type substrate holder showed a good crystalline quality with a minimum yield value xmin of 0. 9MeV He ions 3.8%. The post-annealing degraded the crystalline quality to increase xmin up to 11.8%, though it improved both the Tc and Jc. It was supposed that the degradation was caused by the re-arrangement of oxygen atoms.

Keywords

Furnace Channeling 

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References

  1. [1]
    X. X. Xi, G. Linker, O. Meyer and J. Geerk, J. Less-Common Met. 151, 295, 1989.CrossRefGoogle Scholar
  2. [2]
    H. Kajikawa, Y. Fukumoto, K. Shibutani, S. Hayashi, R. Ogawa and Y. Kawate, to be published in Proceedings for ISS’90, 1990.Google Scholar

Copyright information

© Springer-Verlag Berlin, Heidelberg 1992

Authors and Affiliations

  • H. Kajikawa
    • 1
  • Y. Fukumoto
    • 1
  • K. Shibutani
    • 1
  • S. Hayashi
    • 1
  • K. Ishibashi
    • 2
  • K. Inoue
    • 2
  1. 1.Superconducting and Cryogenic Technology CenterKobe Steel, Ltd.KobeJapan
  2. 2.Electronics Research LaboratoryKobe Steel, Ltd.KobeJapan

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