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Photochemistry at Adsorbate-Metal Interfaces: Intra-adsorbate Bond Breaking

  • J. M. White
Part of the Springer Series in Surface Sciences book series (SSSUR, volume 22)

Abstract

While photochemistry in gases, liquids and solids has a long and well-documented record [3.1], and photochemistry, including photoelectrochemistry, at semiconductor-adsorbate interfaces is well known [3.2], photochemistry at adsorbate-metal interfaces is a newly emerging and rapidly expanding area of surface chemistry. There are also a number of recent interesting experiments involving photochemistry of molecules adsorbed at insulator surfaces [3.3]. In this paper we focus on bond cleavage within the first monolayer of adsorbate rather than on adsorbate-metal bond cleavage or photochemistry in multilayers. The latter topic has been the subject of a number of investigations and reviews [3.4–6], Table 3.1 lists a number of recent successful photochemical intraadsorbate bond cleavage experiments [3.7–27]. An interesting comparison is given in Table 3.2, which lists experiments where no photochemistry was observed [3.28–31].

Keywords

Bond Breaking Methyl Bromide Direct Excitation Valence Band Hole Ethyl Chloride 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 1990

Authors and Affiliations

  • J. M. White
    • 1
  1. 1.Department of ChemistryUniversity of TexasAustinUSA

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