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Amorphous and Crystalline Silicon Carbide II pp 198–206Cite as

Applications of High Purity SiC Prepared by Chemical Vapor Deposition

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Part of the book series: Springer Proceedings in Physics ((SPPHY,volume 43))

Abstract

Applications of free-standing CVD-SiC films are presented. After the growth of the CVD-SiC on a graphite substrate, we can get freestanding films with various thicknesses by burning off the substrate at high temperature. Three-dimensional complex free-standing products are obtained by using the machined complex graphite. The grown layers are yellow in color and cubic in structure.

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References

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Author information

Authors and Affiliations

  1. Business Planning & Development Headquarters, Mitsui Engineering & Shipbuilding Co., Ltd., 3-16-1 Tamahara, Tamano City, Okayama, Japan

    Y. Chinone, S. Ezaki, F. Fujita & K. Matsumoto

Authors
  1. Y. Chinone
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  2. S. Ezaki
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  3. F. Fujita
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  4. K. Matsumoto
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Editor information

Editors and Affiliations

  1. Microelectronics Laboratory, Santa Clara University, Santa Clara, CA, 95053, USA

    Mahmud M. Rahman  & Cary Y.-W. Yang  & 

  2. Materials Science Research Center of Excellence, Howard University, 2300 6th Street N.W., Washington, DC, 20059, USA

    Gary L. Harris

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© 1989 Springer-Verlag Berlin, Heidelberg

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Chinone, Y., Ezaki, S., Fujita, F., Matsumoto, K. (1989). Applications of High Purity SiC Prepared by Chemical Vapor Deposition. In: Rahman, M.M., Yang, C.YW., Harris, G.L. (eds) Amorphous and Crystalline Silicon Carbide II. Springer Proceedings in Physics, vol 43. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-75048-9_40

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  • DOI: https://doi.org/10.1007/978-3-642-75048-9_40

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-75050-2

  • Online ISBN: 978-3-642-75048-9

  • eBook Packages: Springer Book Archive

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