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Toxicological Investigations of Waste Products from the Plasma Etching Process in the Semiconductor Industry

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Recent Developments in Toxicology: Trends, Methods and Problems

Part of the book series: Archives of Toxicology ((TOXICOLOGY,volume 14))

Abstract

Plasma etching processes in the semiconductor industry are accompanied by the formation of waste products with potential toxicity. There is only limited knowledge about the occupational and environmental risks of these substances.

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© 1991 Springer-Verlag Berlin Heidelberg

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Bauer, S. et al. (1991). Toxicological Investigations of Waste Products from the Plasma Etching Process in the Semiconductor Industry. In: Chambers, P.L., Chambers, C.M., Wiezorek, W.D., Golbs, S. (eds) Recent Developments in Toxicology: Trends, Methods and Problems. Archives of Toxicology, vol 14. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-74936-0_65

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  • DOI: https://doi.org/10.1007/978-3-642-74936-0_65

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-51422-0

  • Online ISBN: 978-3-642-74936-0

  • eBook Packages: Springer Book Archive

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