Abstract
Resonant tunnelling (RT) through semiconductor double barriers (DB’s) was first demonstrated by Chang et al. [7.1] in 1974. With the development of modern crystal growth techniques, like molecular beam epitaxy (MBE), there has been renewed interest in the subject in recent years [7.2–23]. Material quality has improved to the point that negative differential resistance (NDR) can be observed at room temperature [7.2]. Intense research efforts are directed towards the optimization of the performances of the RT DB’s and their utilization as the building blocks of novel electronic and optical devices.
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It should be noted that while the exposed portion of the channel is depleted, the portion under the emitter is not. This follows unambiguously from the identification of the current peaks with resonant tunnelling. At the bias conditions corresponding to the resonances in the range Vo 0, the field drop associated with charge in the quantum well is always 2 x 105 V/cm corresponding to n Z, 2 x 1012 cm-2.
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Capasso, F., Sen, S., Beltram, F., Cho, A.Y. (1990). Resonant Tunnelling and Superlattice Devices: Physics and Circuits. In: Capasso, F. (eds) Physics of Quantum Electron Devices. Springer Series in Electronics and Photonics, vol 28. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-74751-9_7
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