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Nanolithography for Ultra-Small Structure Fabrication

  • H. G. Craighead
Part of the Springer Series in Electronics and Photonics book series (SSEP, volume 28)

Abstract

The ability to fabricate structures and devices with dimensions smaller than relevant physical length scales is leading to the discovery and exploitation of new physical phenomena. This chapter describes some of the techniques used for advanced nanofabrication processes along with the physical and practical limits.

Keywords

Resolution Limit Electron Beam Lithography Pattern Transfer Scan Electron Beam Solid State Technology 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 1990

Authors and Affiliations

  • H. G. Craighead

There are no affiliations available

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