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Monolayer Sensitive X-Ray Diffraction Techniques: A Short Guided Tour Through the Literature

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Semiconductor Interfaces

Part of the book series: Springer Proceedings in Physics ((SPPHY,volume 22))

Abstract

The advent of powerful X-ray sources, rotating anode X-ray generators and Synchrotron Radiation sources, has made possible the detection of X-ray diffraction signals or of secondary effects excited by diffracted X-rays, produced in atom monolayers.

Such methods have found numerous applications in the characterization of semiconductor surfaces and interfaces and can be classified in two main groups: surface or superficial layer scattering collected in a grazing incidence geometry, with application to the determination of the atomic structure in surface unit cell, the second group is concerned with the excitation of surface or interface atoms by Bragg diffraction-induced X-ray standing waves.

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Author information

Authors and Affiliations

  1. LURE, CNRS-MEN-CEA, Bât. 209D, F-91405, Orsay, France

    M. Sauvage-Simkin

  2. Laboratoire de Minéralogie-Cristallographie, Universités Pierre et Marie Curie et Paris VII, Associé au CNRS, 4, Place Jussieu, F-75252, Paris Cedex, France

    M. Sauvage-Simkin

Authors
  1. M. Sauvage-Simkin
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Editor information

Editors and Affiliations

  1. Campus de Luminy, C.R.M.C.2, CNRS, Case 913, F-13288, Marseille, Cedex 09, France

    Guy Le Lay

  2. L.E.P.E.S., CNRS, BP 166, F-38042, Grenoble, France

    Jacques Derrien

  3. Centre de Physique Théorique, F-74310, Les Houches, France

    Nino Boccara

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© 1987 Springer-Verlag Berlin Heidelberg

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Sauvage-Simkin, M. (1987). Monolayer Sensitive X-Ray Diffraction Techniques: A Short Guided Tour Through the Literature. In: Le Lay, G., Derrien, J., Boccara, N. (eds) Semiconductor Interfaces. Springer Proceedings in Physics, vol 22. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-72967-6_5

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  • DOI: https://doi.org/10.1007/978-3-642-72967-6_5

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-72969-0

  • Online ISBN: 978-3-642-72967-6

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