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Microwave-Plasma Deposition of Diamond

  • Evelio Sevillano
Part of the Springer Series in Materials Processing book series (SSMATERIALSPROC)

Abstract

Microwave-plasma enhanced chemical vapor deposition (MPECVD) is among the most widely used techniques for diamond growth from the gas phase. From its inception in the early 1980s [2.1], the technique has found a lot of success because of its simplicity, flexibility, and the early commercial availability of reactors from New Japan Radio Corporation based on the NIRIM (National Institute for Research in Inorganic Materials) work. The reactor developed at NIRIM consisted of an evacuated quartz tube which was inserted through a waveguide. A hydrogen-methane plasma was formed inside the tube and was used to create the proper gas chemistry for diamond growth. Research programs that used this technique flourished in Japan, and the first attempt at a production unit using NIRIM type reactors was made [2.2].

Keywords

Microwave Power Diamond Film High Power Density Discharge Tube Electron Cyclotron Resonance 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 1998

Authors and Affiliations

  • Evelio Sevillano
    • 1
  1. 1.Applied Science and Technology, Inc. (ASTeX)WoburnUSA

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