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CVD Diamond for X-ray Windows and Lithography Mask Membranes

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Low-Pressure Synthetic Diamond

Part of the book series: Springer Series in Materials Processing ((SSMATERIALSPROC))

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Abstract

Diamond possesses a number of interesting properties that make it an ideal candidate for a variety of X-ray applications. The most important ones in this context are high X-ray and visible light transmissivity, high mechanical stiffness and dimensional stability, high thermal conductivity, a low thermal expansion coefficient, high radiation stability, and high corrosion resistance. This unique combination of properties, along with the advent of CVD techniques that allow growth of diamond in the form of thin films on large (> 50 mm diameter) substrates, has led to the exploitation of diamond films as X-ray detector [11.1–7] and X-ray tube window materials [11.8], as high-resolution X-ray lithography (XRL) mask membranes [11.9–19], and as deep lithography (DXRL) mask supports for LIGA (German acronym for Lithographie-Galvanik-Abformung) microfabrication technology (see, e.g., [11.12, 20, 21]). The purpose of this chapter is to summarize the present state of the art of CVD-diamond films in the above-mentioned application areas, to outline advantages and drawbacks of CVD diamond, and to compare it with standard technology and competing materials.

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Authors and Affiliations

  1. Philips Research Laboratories Aachen, Weisshausstrasse 2, D-52066, Aachen, Germany

    Peter K. Bachmann & Detlef U. Wiechert

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  1. Peter K. Bachmann
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  2. Detlef U. Wiechert
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Editors and Affiliations

  1. Fraunhofer-Institut für Angewandte Festkörperphysik, Tullastrasse 72, D-79108, Freiburg, Germany

    Bernhard Dischler  & Christoph Wild  & 

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Bachmann, P.K., Wiechert, D.U. (1998). CVD Diamond for X-ray Windows and Lithography Mask Membranes. In: Dischler, B., Wild, C. (eds) Low-Pressure Synthetic Diamond. Springer Series in Materials Processing. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-71992-9_11

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  • DOI: https://doi.org/10.1007/978-3-642-71992-9_11

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-71994-3

  • Online ISBN: 978-3-642-71992-9

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