Abstract
Si-based heterostructures are being intensively studied since various new functionalities which cannot be obtained with Si alone are expected owing to the predictable and controllable modification of the band structure [1]. In particular, SiGe/Si heterostructures are of great importance and have had significant impact on Si-based device applications as well as on the basic science of semiconductors. The built-in strain is not an obstacle but is now regarded as an advantage since it can give additional flexibility in the band engineering.
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References
Properties of strained and relaxed Silicon Germanium,edited by E. Kasper (Institution of Electrical Engineers, London, 1995)
J. Weber and M.I. Alonso, Phys. Rev. B 40, 5683 (1989)
D.J. Robbins, L.T. Canham, S.J. Barnett, A.D. Pitt, and P. Calcott, J. Appl. Phys. 71, 1407 (1992)
R. People, Phys. Rev. B 32, 1405 (1985)
G.G. Van de Walle, Phys. Rev. B 39, 1871 (1989)
K. Ismail, M. Arafa, K.L. Saenger, J.O. Chu, and B.S. Meyerson, Appl. Phys. Lett. 66, 1077 (1995)
J.C. Sturm, H. Monoharan, L.C. Lenchyshyn, M.L.W. Thewalt, N.L. Rowell, J.-P. Nöl, and D.C. Houghton, Phys. Rev. Lett. 66, 1362 (1991)
J. Brunner, U. Menczigar, M. Gail, E. Friess, and G. Abstreiter, Thin Solid Films 222, 27 (1992)
S. Fukatsu, Solid-State Electron. 37, 817 (1993) and references therein
U. Menczigar, G. Abstreiter, S. Olajos, H. Grimmeiss, H. Kibbel, H. Presting, and E. Kasper, Phys. Rev. B 47, 4099 (1993)
Q. Mi, X. Xiao, J.C. Sturm, L.C. Lenchyshyn, and M.L.W. Thewalt, Appl. Phys. Lett. 60, 3177 (1992)
S. Fukatsu, N. Usami, Y. Shiraki, A. Nishida, and K. Nakagawa, Appl. Phys. Lett. 63, 967 (1993)
D.K. Nayak, N. Usami, S Fukatsu, and Y. Shiraki, Appl. Phys. Lett. 63, 3509 (1993)
N. Usami, F. Issiki, D.K. Nayak, Y. Shiraki, and S. Fukatsu, Appl. Phys. Lett. 67, 524 (1995)
K. Brunner, W. Winter, and K. Eberl, Appl. Phys. Lett. 69, 1279 (1996)
N. Usami, Y. Shiraki, and S. Fukatsu, Appl. Phys. Lett. 68, 2340 (1996)
N. Usami, T. Mine, S. Fukatsu, and Y. Shiraki, Appl. Phys. Lett. 63, 2789 (1993)
N. Usami, H. Akiyama, S. Fukatsu, and Y. Shiraki, Phys. Rev. B 52, 5132 (1995)
N. Usami, T. Mine, S. Fukatsu, and Y. Shiraki, Appl. Phys. Lett. 64, 1126 (1994)
H. Sunamura, N. Usami, Y. Shiraki, and S. Fukatsu, Appl. Phys. Lett. 68, 1847 (1996)
H. Sunamura, Y. Shiraki, and S. Fukatsu, Solid-State Electron. 40, 693 (1996)
H. Sunamura, N. Usami, Y. Shiraki, and S. Fukatsu, Appl. Phys. Lett. 66, 3024 (1995)
H. Sunamura, N. Usami, Y. Shiraki, and S. Fukatsu, J. Cryst. Growth 157 (1996)
E.S. Kim, N. Usami, and Y. Shiraki, Appl. Phys. Lett. 70, 295 (1997)
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Usami, N., Shiraki, Y. (1998). SiGe Quantum Structures. In: Ando, T., Arakawa, Y., Furuya, K., Komiyama, S., Nakashima, H. (eds) Mesoscopic Physics and Electronics. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-71976-9_35
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DOI: https://doi.org/10.1007/978-3-642-71976-9_35
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