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Fabrication of Short-Gate GaAs MESFETs by Electron Beam Lithography

  • G. Bernstein
  • D. K. Ferry
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 13)

Abstract

We have used an ISI-100B scanning electron microscope to fabricate GaAs MESFETs with gate lengths between 30 and 100 nm. Direct write was achieved with 40 kV electron exposure of 950 000 molecular weight PMMA and a liftoff process. All fabrication levels were performed using EBL with a desktop computer used to control all timing and vector scan settings. Output was via two 12-bit D/As. The gate metal was 40 nm thick gold and fit in 2.3 to 3 micron source-drain spacings. Maximum gm achieved was 85 ms/mm (with calculated intrinsic gm of 110 ms/mm) for a 45 nm gate device. This is consistent with modeling performed by W. CURTICE at RCA in Princeton, New Jersey, for parameters similar to ours. It was found that pinchoff was achieved for gate voltages of −3 volts and drain voltages up to 2.5 volts. It is believed that charge injection into the substrate caused lack of pinchoff after that point.

Keywords

Gate Voltage Josephson Junction Electron Beam Lithography Charge Injection Gate Length 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Copyright information

© Springer-Verlag Berlin Heidelberg 1986

Authors and Affiliations

  • G. Bernstein
    • 1
  • D. K. Ferry
    • 1
  1. 1.Center for Solid State Electronics ResearchArizona State UniversityTempeUSA

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