Abstract
During the last 50 years, the feature size of components has been reduced from a few centimeters for valves to a few microns for transistors in integrated circuits. Four orders of magnitude have therefore been gained in the race for miniaturization.
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References
Special Issue on Pattern Generation and Microlithography, IEEE E-D, ED-22, N°7 (75)
G. Pircher: Proc. of 9th Int. Vac. Congress and 5th Int. Conf. on Solid Surfaces, Invited and Speakers ’ Volume p. 427 (1985)
Integrated Circuit Engineering, Basic Technology, Boston Technical Publishers Inc. (1966)
Mc Williams, J.P. Herman, F. Mitlisky, R.A. Hyde, L.L. Wood: Appl. Phys. Lett. 43, 10 (1983)
J.M. Ballantyne: Some Examples of Microfabrication Techniques for Submicron Devices., Microcircuit Engineering - Grenoble (1982)
M. Isaacson, A. Murray:J. Vac. Sci. Technol. 19 (4), (Nov/Dec 1981)
A.N. Broers, J.M.E. Harper, W.W. Molzen:Appl. Phys. Lett. 33, 5 (1978)
H. Niedrig :J. Appl. Phys. 53 (4), (1982)
A.N. Broers:IEEE Trans.ED-28, N°1 (1981)
K. Lee, H. Ahmed:J. Vac. Sci. Technol. 19 (4), P946 (1981)
L.D Jackel, R.E. Howard, E.L. Hu, D.M. Tennant, P. Grabbe:Appl. Phys. Lett. 39 (3), P368 (1981)
F. Emoto, K. Gamo, S. Namba, N. Samoto, R. Shinizu, N. Tamura: Microcircuit Engineering 85 (Rotterdam)
A.N. Broers :J. Electrochem. Soc. Solid State Science and Technol. 128 N°1, pl66 (Janv. 1981)
M.E. Mochel, C.J. Humphreys, J.A. Eades, J.M. Mochel, A.M. Petford:Appl. Phys. Lett. 42 (4), p392 (1983)
G. Garry, D. Dieumegard, M. Croset, P. Sudraud, J. Vande Valle: Microcircuit Engineering, p154 - Grenoble (1982)
R.L. Seliger, R.L. Kubena, R.D. Olney, J.W. Ward, V. Wang: J. Vac. Sci. Technol. 16 (6), pl6l0 (1979)
L. Swanson: Microcircuit Engineering, p267 - Amsterdam (1980)
K. Gamo, T. Ukegawa, Y. Inomoto, Y. Ochiai, S. Namba:J. Vac. Sci. Technol. 19 (4), p1182 (1981)
G.R. Hanson, B.M. Siegel:J. Vac. Sci. Technol. 19 (4), p1176 (1981)
G.M. Mladenov, B. Emmoth:Appl. Phys. Lett. 38 (12), p1000 (1982)
H. Ryssel, K. Haberger: Microcircuit Engineering - Lausanne (1981)
U. CH. Fischer, H.P. ZINGSHEIM:Appl. Phys. Lett. 40 (3), p195 (1982)
K. Jain, C.G. Wilson, B.J. Lin: SPIE, 334, p259 (1982)
J.H. Brünings: Microcircuit Engineering 85 (Rotterdam)
J.P. Robic, S. Knight, W. Straub: Microcircuit Engineering, p79 - Grenoble (1982)
G.M. Dubroeucq, D. Zahorski: Microcircuit Engineering, p73 - Grenoble (1982)
A. Heuberger: Microcicuit Engineering 85 (Rotterdam)
J. Trotel, B. Fay: Colloque International sur la Microlithographie, p201 Paris (1977)
D.C. Flanders : Appl. Phys. Lett. 36 (1), p93 (1980)
B. Fay, A. Cornette, J.P. Nivoliers: Microcircuit Engineering, p1l6 - Grenoble (1982)
N.P. Economou, D.C. Flanders:J. Vac. Sci. Technol. 19 (4), p.868 (1981)
J.S. Pearlman, J.C. Riordan:J. Vac. Sci. Technol. 19 (4), p1190 (1981)
R.P. Haelbich, A. Segmuller, E. Spiller:Appl. Phys. Lett. 34, pl84 (1979)
W.D. Grobman: Handbook on Synchroton Radiation,I, Ed. by E.E. Kock, D.E. Eastman and Y. Farge, North Holland, Amsterdam
M.A. Piestrup, P.F. Finman, A.N. Chu, T.W. Barbee, J.R. Richard, H. Pantell, R.A. Gearhart, F.R. Buskirk: IEEEQE 19 N°12
P. Nehmiz, H. Bohlen, J. Greschner:J. Vac. Sci. Technol. 19 (4), P971 (1981)
R. Ward, A.R. Franklin, P. Gould, M.J. Plummer:J. Vac. Sci. Technol. 19 (4), p966 (1981)
J. Frosien, B. Lischke, K. Anger:J. Vac. Sci. Technol. 16 (6), pl827 (1979)
R. Speidel, M. Mayer: Microcircuit Engineering, p43 - Aachen (1979)
T.W. Ofkeefe, J. Vine, R.M. Handy:Solid State Electron. 12, 841 (1969)
I. Mori, K. Sugihara, C. Itoh, Mitabata, T. Shinozaki: Microcircuit Engineering 85 (Rotterdam)
G.A. Wardly : J. Vac.Sci. Technol. 12 (6), p1313 (1975)
L. Karapiperis, C.A. Lee:Appl. Phys. Lett. 35 (5), p457 (1983)
J.N. Randall, D.C. Flanders, N.P. Economou, J.P. Donnelly, E.I. Bromley: Appl. Phys. Lett.42 (5), p457 (1983)
L. Csepregi, P. Eichinger, A. Heuberger: Microcircuit Engineering, p159 Grenoble (1982)
J.L. Bartelt, C.W. Slayman, J.E. Wood, J.Y. Chen, C.M. Mc Kenna, C.P. Minning, J.F. Coakley, R.E. Holman, C.M. Perrygo:J. Vac. Sci. Technol.19 (4), p1166 (1981)
U. Behringer, R. Speidel: Microcircuit Engineering, p369 - Lausanne (1981)
G. Stengl, R. Kaitna, H. Loschner, R. Reider, P. Wolf, R. Sacher: Microcircuit Engineering, p345 - Lausanne (1981)
H. Ryssel, H. Kranz, K. Haberger, J. BOSCH: Microcircuit Engineering, p293 - Amsterdam (1980)
N.P. Economou, D.C. Flanders, J.P. Donnelly:J. Vac. Sci. Technol. 19 (M, p1172 (1981)
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© 1986 Springer-Verlag Berlin Heidelberg
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Pircher, G., Perrocheau, J. (1986). Submicron Lithography Tools. In: Kelly, M.J., Weisbuch, C. (eds) The Physics and Fabrication of Microstructures and Microdevices. Springer Proceedings in Physics, vol 13. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-71446-7_2
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DOI: https://doi.org/10.1007/978-3-642-71446-7_2
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