Abstract
This paper contains comments on present day limits to microlithography. The methods discussed are those used to fabricate semiconductor integrated circuits, but the same methods are also used to fabricate integrated optical devices, thin film displays and a variety of other devices of commercial and scientific interest.
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References
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Broers, A.N. (1986). High Resolution Lithography (Some Comments on Limits and Future Possibilities). In: Kelly, M.J., Weisbuch, C. (eds) The Physics and Fabrication of Microstructures and Microdevices. Springer Proceedings in Physics, vol 13. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-71446-7_1
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DOI: https://doi.org/10.1007/978-3-642-71446-7_1
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