High Resolution Lithography (Some Comments on Limits and Future Possibilities)

  • A. N. Broers
Part of the Springer Proceedings in Physics book series (SPPHY, volume 13)


This paper contains comments on present day limits to microlithography. The methods discussed are those used to fabricate semiconductor integrated circuits, but the same methods are also used to fabricate integrated optical devices, thin film displays and a variety of other devices of commercial and scientific interest.


Proximity Effect Electron Beam Lithography Optical Projection Fresnel Diffraction Exposure Distribution 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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  1. 1.
    A.N. Broers: InMaterials for Microiithoqraphy, ed. by L.Thompson etal., (Am. Chem. Soc., Washington, D.C. 1 984) p.11, and A.N.Broers and T.H.P Chang: InMicrocircuit Engineering 78, ed. by H. Ahmed and W.C.Nixon, ( Cambridge University Press 1978 ), p. 1Google Scholar
  2. 2.
    Microcircuit Engineering 83, ed. by H. Ahmed, J.R.A. Cleaver and G.A.C. Jones (Academic Press, London 1983);Microcircuit Engineering 84, ed. by A.Heuberger and H.Beneking (Acadamic Press, London, 1985);Microcircuit Engineering 85, ed. by K. D. van der Mast and S.Radelaar (North Holland, Amsterdam, 1 985)Google Scholar
  3. 3.
    D.L. Spears and H.I. Smith: ELectron. Lett. 8, p.102, (1972)CrossRefGoogle Scholar
  4. 4.
    A.E. Gruen : Z. Naturforsch, 12a, p.89, (1957)Google Scholar
  5. 5.
    E. Spiller and R. Feder:. In H.JQuesser X-Ray Optics, (Springer, Berlin 1977)Google Scholar
  6. 6.
    A. Heuberger: Solid State Technology, February, (1986)Google Scholar
  7. 7.
    H. Bohlen: IBM J. Res. Dev.26, p.568, (1 982)Google Scholar
  8. 8.
    R.L. Seliger etal.: J. Vac. Sci. Technol.,16, p. 1 610, (1979)Google Scholar
  9. 9.
    D. Markle: Solid State Technology, September, (1984)Google Scholar
  10. 10.
    H.C. Pfeiffer: IEEE Trans. Electron. Dev.ED-26, p. 663, (1979)Google Scholar
  11. 11.
    A.N. Broers and P. Coane: to be published Appl. Phys. Lett. (1986)Google Scholar
  12. 12.
    M.A. Sturans and H.C. Pfeiffer: InMicrocircuit Engineering 84, ed. by A. Heuberger and H. Beneking ( Academic Press, London 1984 ), p. 107Google Scholar
  13. 13.
    K.D. Van der Mast, G.H. Jansen and J.E. Barth: InMicrocircuit Engineering 85, ( North Holland, Amsterdam 1985 ), p. 43Google Scholar
  14. 14.
    T.E. Everhart: InMaterials in Microlithography, ed. by L.F.Thompson etal., ( Am. Chem. Soc. Washington, D.C. 1984 ) p. 5Google Scholar
  15. 15.
    T.H.P. Chang: J. Vac. Sci. Technol.12, p. 1 27, (1975)Google Scholar
  16. 16.
    A.N. Broers: J. Electrochem. Soc.,128, p. 166, (1980)Google Scholar
  17. 17.
    T.O. Sedgwick, A.N. Broers and B.J. Agule: J. Electrochem. Soc.,119, p. 1 769, (1972)Google Scholar
  18. 18.
    A.N. Broers, J.J. Cuomo, J. Harper, W. Molzen, R. Laibowitz, M. Pomerantz:Electron Microscopy 1978, Vol. Ill, ed. by J.M. Sturgess, (Microscopical Soc. of Canada, Toronto 1978) p. 343–354, and A.N. Broers, J.J. Cuomo and W. Krakow:IBM Technical Disclosure Bulletin, 24, p.1534, (1981)Google Scholar
  19. 19.
    M. Isaacson and A. Muray: J. Vac. Sci. Technol.,19, p. 1117, (1981)Google Scholar
  20. 20.
    M.E.Mochel, C.J.Humphreys, J.M.Mochel and J.A.Eades: Proc. 41st Annual Meeting of the Electron Microscopy Soc. of America, (San Francisco Press 1983), p.100Google Scholar
  21. 21.
    A.F.Mayadas and R.B.Laibowitz: Phys. Rev. Lett.,28 p. 156, (1972)Google Scholar
  22. 22.
    W.S.Mackie, W.Patrick, S.P.Beaumont and C.D.W.Wilkinson:Microcircuit Engineering 84, ( Academic Press, London 1985 ), p. 213Google Scholar
  23. 23.
    R.E.Howard, L.D.Jackel and W.J.Skocpol: Microcircuit Engineering 85 (North Holland, Amsterdam 1985), p.3Google Scholar
  24. 24.
    R.B.Laibowitz etal.: Appl. Phys. Lett., 35, p.891, (1979CrossRefGoogle Scholar
  25. 25.
    R.Voss, etal.: Appl. Phys. Lett., 37, p.656, (1980)CrossRefGoogle Scholar
  26. 26.
    P.Chaudhari, A.N.Broers, C.C.Chi, R.B.Laibowitz, E.Spiller and J.Viggiano: Physics Review Letters, 45, p.930, (1980)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1986

Authors and Affiliations

  • A. N. Broers
    • 1
  1. 1.Cambridge University Engineering DepartmentCambridgeEngland

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