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High Resolution Lithography (Some Comments on Limits and Future Possibilities)

  • A. N. Broers
Part of the Springer Proceedings in Physics book series (SPPHY, volume 13)

Abstract

This paper contains comments on present day limits to microlithography. The methods discussed are those used to fabricate semiconductor integrated circuits, but the same methods are also used to fabricate integrated optical devices, thin film displays and a variety of other devices of commercial and scientific interest.

Keywords

Proximity Effect Electron Beam Lithography Optical Projection Fresnel Diffraction Exposure Distribution 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 1986

Authors and Affiliations

  • A. N. Broers
    • 1
  1. 1.Cambridge University Engineering DepartmentCambridgeEngland

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