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High-Speed Internal Photoemission Detectors Enhanced by Grating Coupling to Surface Plasma Waves

  • S. R. J. Brueck
  • V. Diadiuk
  • T. Jones
  • W. Lenth
Conference paper
Part of the Springer Series in Electrophysics book series (SSEP, volume 21)

Abstract

The use of gratings to couple optical energy into surface plasma wave (SPW) modes that are confined to a metal-dielectric boundary has been extensively explored [1]. With optimal choices of the grating period and profile, nearly 100% coupling efficiency has been achieved in wavelength ranges where the metal is normally almost totally reflecting. We report the use of this coupling to enhance the quantum efficiency of internal-photoemission detectors in which hot carriers, generated in a metal film by optical absorption, are collected by photoemission over a Schottky barrier into a semiconductor. This class of detectors is of interest as a result of its uniformity, high-speed potential, long wavelength response with binary rather than quaternary III–V compounds, and compatibility with integrated circuit fabrication techniques [2, 3, 4]. For metal-silicide/Si systems, which have been the most thoroughly explored, techniques such as back-illumination and double-pass insulator-metal overlayer structures already provide quite high absorption (> 40%) at infrared wavelengths. Surface texturing has also been used to enhance the responsivity of metal-insulator-metal tunnel junction detectors and of metal-(a-Si)-metal detectors [5,6].

Keywords

Schottky Barrier Reverse Bias Depletion Region Angular Response Surface Plasma Wave 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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    G. N. Zhizhin, M. A. Moskalova, E. V. Shomina and V. A. Yakovlev, in Surface Polaritons, V. M. Agranovich and D. L. Mills, Eds. (North-Holland, New York, 1982).Google Scholar
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    S. R. J. Brueck, V. Diadiuk, W. Lenth and T. Jones, Appl. Phys. Lett. (May 15, 1985, to be published).Google Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1985

Authors and Affiliations

  • S. R. J. Brueck
    • 1
  • V. Diadiuk
    • 1
  • T. Jones
    • 1
  • W. Lenth
    • 1
  1. 1.Lincoln LaboratoryMassachusetts Institute of TechnologyLexingtonUSA

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