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Evolution and Performance of the Nova NV-ID Predep™ Implanter

  • Conference paper
Ion Implantation Techniques

Part of the book series: Springer Series in Electrophysics ((SSEP,volume 10))

Abstract

Nova Associates was founded in September 1978 with the goal of developing a new generation of high-current (10mA), low-energy implanters. The basic performance objectives and machine configuration were established in November 1978 and have not changed significantly since (see Section 2). However, the system and subsystem designs have evolved along the expected learning curve. Sixty systems have now been shipped and a pattern of actual performance characteristics is emerging.

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Author information

Authors and Affiliations

  1. Ion Implantation Division, Eaton Corporation, Beverly, MA, 01915, USA

    G. Ryding

Authors
  1. G. Ryding
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Editor information

Editors and Affiliations

  1. Frauenhofer — Institut für Festkörpertechnologie, Paul-Gerhardt-Allee 42, D-8000, München 60, Fed. Rep. of Germany

    Heiner Ryssel

  2. Siemens AG, Balanstraße 73, D-8000, München 80, Fed. Rep. of Germany

    Hans Glawischnig

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© 1982 Springer-Verlag Berlin Heidelberg

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Ryding, G. (1982). Evolution and Performance of the Nova NV-ID Predep™ Implanter. In: Ryssel, H., Glawischnig, H. (eds) Ion Implantation Techniques. Springer Series in Electrophysics, vol 10. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-68779-2_12

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  • DOI: https://doi.org/10.1007/978-3-642-68779-2_12

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-68781-5

  • Online ISBN: 978-3-642-68779-2

  • eBook Packages: Springer Book Archive

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