Skip to main content

Breakdown and Wearout Phenomena in SiO2

  • Conference paper
Insulating Films on Semiconductors

Part of the book series: Springer Series in Electrophysics ((SSEP,volume 7))

Abstract

Technological improvements have largely cancelled the effects of contaminations but the mechanisms of shorting at high and medium fields have not been understood so well. New experimental evidence is incompatible with existing breakdown theories. Novel electrical testing techniques have given evidence that charge incorporation or charge flux through the dielectric plays an essential role in the deterioration of the insulator. In the absence of a sound theory a model will be discussed assuming gaseous discharges.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. Budenstein, P.P., IEEE, E. I. 15, 1980, p. 225

    Google Scholar 

  2. Klein, N., Thin Sol. Films 50, 1078, p. 223

    Article  Google Scholar 

  3. Solomon, P., J. Vac. Sci. Technol. 14, 1977, p. 1122

    Article  CAS  Google Scholar 

  4. Osburn, C.M., J. of Sol. St. Chem. 12, 1975, 232

    Article  CAS  Google Scholar 

  5. Kern,W., RCA Review 31, 1973, 234

    Google Scholar 

  6. Harari, E., J. Appl. Phys., 49, 1978, p. 2478

    Article  CAS  Google Scholar 

  7. Johnson, N., Kotz S., Distribution in Statistics (1970) John Wiley and Sons, N.Y.

    Google Scholar 

  8. Gumbel, E.J., Statistics of Extremes, 1958, Columbia University Press, N.Y.

    Google Scholar 

  9. de Wit, H.J., Wijenberg, C., and Crevecoeur, C., J. El. Chem. Soc. 123, 1976, p. 231

    Google Scholar 

  10. Solomon, P., Klein, N., and Albert, M., Thin Solid Films 35, 1976, p. 321

    Article  CAS  Google Scholar 

  11. Kristiansen, K., Vacuum 27, 1977, p. 227

    Article  CAS  Google Scholar 

  12. Weber, K.H., and Endicott, H.S., AIEE Trans. 76, Power App. Syst. p. 393

    Google Scholar 

  13. Wolters, D.R., Hoogestijn, T., and Kraay, H., The Phys. of MOS Insulators, Proc. Int. Top Conf. Raleigh N.C. (1980) 349

    Google Scholar 

  14. Lenzlinger, M., and Snow, E.H., J. Appl. Phys. 40, 1969, p. 287

    Google Scholar 

  15. Anolick, E.S., and Nelson, G.R., Proceedings 17th annual IEEE, 1979, Reliability Physics p.8

    Google Scholar 

  16. Crook, D.L., IEEE, 1979, Reliability Physics, 17th annual Proceedings, p.1

    Google Scholar 

  17. Li, S.P., and Maserjian, J., IEEE trans E.D. 23, 1976, p. 525

    Article  Google Scholar 

  18. Metzler, R.A., IEDM (1979) 233

    Google Scholar 

  19. Walden, R.H., J. Appl. Phys. 43, 1972, p. 1178

    Article  CAS  Google Scholar 

  20. Ushirokawa, A., Suzuki, E., Warashina M., Jap. J. Appl. Phys. 12, 1973, 398

    Article  CAS  Google Scholar 

  21. Harari, E., J. Appl. Phys. Lett., 30, 1977, p. 601

    CAS  Google Scholar 

  22. Osburn, C.M., and Ormond, D.W., J. El. Chem. Soc. 119, 1972, p. 591–597

    CAS  Google Scholar 

  23. Osburn, C.M., Bassous, E., J. El. Chem. Soc. 122, 1975, p. 89

    CAS  Google Scholar 

  24. Eernisse, E.P., Appl. Phys. Lett., 30, 1977, p. 290–293

    Article  CAS  Google Scholar 

  25. Kolbesen, B., and Strunk, H., Inst. Phys. Cont. Ser. 57, 1980, p. 21

    CAS  Google Scholar 

  26. Wolters, D.R., J. El. Chem. Soc. 127, 1980, p. 2072

    CAS  Google Scholar 

  27. Isomae, S., Tamaki, Y., Yajima, A., Nanba, M., and Maki, M., J. Electrochem. Soc. 126, 1014 (1979)

    Article  CAS  Google Scholar 

  28. Ferry, D.K., Sol. State Comm., 18, 1976, p. 1051

    Article  CAS  Google Scholar 

  29. Wolters, D.R., and Verwey, J.F., This proceedings (1981)

    Google Scholar 

  30. Solomon, P., J. Appl. Phys. 48, (1977) p. 3847

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1981 Springer-Verlag Berlin Heidelberg

About this paper

Cite this paper

Wolters, D.R. (1981). Breakdown and Wearout Phenomena in SiO2 . In: Schulz, M.J., Pensl, G. (eds) Insulating Films on Semiconductors. Springer Series in Electrophysics, vol 7. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-68247-6_29

Download citation

  • DOI: https://doi.org/10.1007/978-3-642-68247-6_29

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-68249-0

  • Online ISBN: 978-3-642-68247-6

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics