Abstract
The development of rare gas halogen (RGH) lasers in the pulse discharge configuration has greatly increased the potential for their applications in photochemical experiments. Table I summarizes the energy and power presently available from a small scale device developed at the Los Alamos Scientific Laboratory. This device has a nominal length of 100 cm, an active volume of about 100 cc, and operates at 1 Hz using uv preionization for stabilization of the main discharge. Further details of the device are given in references [1,2].
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References
R. C. Sze and T. R. Loree, “Experimental Studies of a KrF/ArF Discharge Laser,” to be published in IEEE J.Q.E., Dec. 1978.
A. E. Greene and C. A. Brau, “Theoretical Studies of uv Preionized Transverse Discharges,” to be published in IEEE-J.Q.E., Dec. 1978.
a) T. R. Loree, R. C. Sze, and D. L. Barker, “Efficient Raman Shifting of ArF and KrF Laser Wavelengths,” Appl. Phys. Lett. 31, 37 (1977). (b) T. R. Loree, R. C. Sze, D. L. Barker, and P. B. Scott, “New Lines in the uv: SRS of Excimer Laser Wavelengths,” to be published in IEEE-J.Q.E.
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J. H. Clark, “Laser Photochemical Purification of Photovoltaic Materials,” McGraw Hill Yearbook of Science & Technology, in press.
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A. P. Baronovski, “UV Laser Reaction Kinetics and Multiphoton Process,” included elsewhere in these proceedings.
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© 1979 Springer-Verlag Berlin Heidelberg
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Rockwood, S.D. (1979). Rare Gas Holgen Lasers and Photochemical Applications. In: Kompa, K.L., Smith, S.D. (eds) Laser-Induced Processes in Molecules. Springer Series in Chemical Physics, vol 6. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-67254-5_1
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DOI: https://doi.org/10.1007/978-3-642-67254-5_1
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