Skip to main content

SIMS Study of Metallized Silicon Semiconductors

  • Conference paper
  • 214 Accesses

Part of the book series: Springer Series in Chemical Physics ((CHEMICAL,volume 9))

Abstract

Transition-metal silcides have been used extensively as contact layers in semiconductor applications [1,2]. These applications are becoming more important as electronic circuit complexity and scale of integration increase.

This is a preview of subscription content, log in via an institution.

Buying options

Chapter
USD   29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD   84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD   109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Learn about institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. J.M. Poate, et al., Thin Films — Interdiffusion and Reaction (Wiley, New York, 1978).

    Google Scholar 

  2. B.L. Crowder and S. Zirinsky, IEEE J. Solid State Circuits SC-14, 291 (1979).

    Google Scholar 

  3. J.M. Poate and T.C. Tisone, Appl. Phys. Lett. 24, 391 (1974).

    Article  ADS  Google Scholar 

  4. H. Muta and D. Shinoda, J. Appl. Phys. 43, 1913 (1972).

    Article  Google Scholar 

  5. D.H. Lee, et al., Phys. Statis Solidi (a) 15, 645 (1973).

    Article  ADS  Google Scholar 

  6. W.F. van der Weg, et al., Application of Ion Beams to Metals, edited by S.T. Picraux, et al. (Plenum Press, New York, 1974), p. 209.

    Google Scholar 

  7. B.Y. Tsaur, et al., Appl. Phys. Lett. 34, 168 (1979).

    Article  ADS  Google Scholar 

  8. K.L. Wang, et al., J. Vac. Sci. Technol. 6, 130 (1979).

    Article  ADS  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 1979 Springer-Verlag New York

About this paper

Cite this paper

Wang, K.L., Storms, H.A. (1979). SIMS Study of Metallized Silicon Semiconductors. In: Benninghoven, A., Evans, C.A., Powell, R.A., Shimizu, R., Storms, H.A. (eds) Secondary Ion Mass Spectrometry SIMS II. Springer Series in Chemical Physics, vol 9. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-61871-0_34

Download citation

  • DOI: https://doi.org/10.1007/978-3-642-61871-0_34

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-61873-4

  • Online ISBN: 978-3-642-61871-0

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics