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Thin Film Deposition and Surface Modification by Cluster Beams

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Cluster Beam Synthesis of Nanostructured Materials

Part of the book series: Springer Series in Cluster Physics ((CLUSTER))

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Abstract

The bombardment of solids by ions or energetic neutrals gives rise to a variety of phenomena widely utilized for the modification of surfaces and the deposition of thin films with tailored properties [5.1]. Depending on ion energies and fluxes, ion beams induce etching, sputtering, implantation, and thin film growth. These effects are schematically shown in Fig.5.1.

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  1. INFM-Dipartimento di Fisica, Università di Milano, Via Celoria 16, 20133, Milano, Italy

    Dr. Paolo Milani

  2. Centro di Fisica degil Stati Aggregati-CNR/ITC, Via Sommarive 18, 38050, Povo id Trento, Italy

    Dr. Salvatore Iannotta

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Milani, P., Iannotta, S. (1999). Thin Film Deposition and Surface Modification by Cluster Beams. In: Cluster Beam Synthesis of Nanostructured Materials. Springer Series in Cluster Physics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-59899-9_5

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