Abstract
Plasma diagnostics is a broad area of technology that encompasses a diverse, venerable field of experimental techniques designed to provide information about the characteristics of a plasma. Plasmas used in microelectronics processing fall into the broad category of low temperature plasmas. Typical plasma characteristics include electron densities between 109 and 1012 cm-3, electron temperatures from 0.1 to 10 eV, pressures of a few Torr to millitorr or below and excitation frequencies from dc to microwave. These parameters span a relatively wide range of conditions and make the selection of the best diagnostic tools challenging.
Keywords
- Langmuir Probe
- Electron Energy Distribution Function
- Double Probe
- Sheath Edge
- Photodetachment Cross Section
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Hebner, G.A., Miller, P.A., Woodworth, J.R. (2000). Overview of Plasma Diagnostic Techniques. In: Shul, R.J., Pearton, S.J. (eds) Handbook of Advanced Plasma Processing Techniques. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-56989-0_5
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