Abstract
Additional terms have to be added to the right-hand sides of the carrier balance equations for electrons and holes in order to describe the initial injection of charge caused by the loss of kinetic energy of a single ion penetrating a semiconductor device. Two-dimensional simulations of a reverse biased power diode yield the temporal and spatial distribution of the device-internal electric field initiated by an intruding ion. For small reverse biases the charge generated within the device corresponds to the total absorption of the ion’s kinetic energy. Applying a sufficiently high reverse bias a steep field peak forms which is able to propagate through the whole device with an undiminished peak height. Due to the corresponding strong avalanche multiplication a large amount of additional charge can be generated. The results obtained from our device simulations conform well to recent experimental findings
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© 2002 Springer-Verlag Berlin Heidelberg
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Kaindl, W., Sölkner, G., Wachutka, G. (2002). Modeling of Ion-Induced Charge Generation in High Voltage Diodes. In: Breuer, M., Durst, F., Zenger, C. (eds) High Performance Scientific And Engineering Computing. Lecture Notes in Computational Science and Engineering, vol 21. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-55919-8_41
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DOI: https://doi.org/10.1007/978-3-642-55919-8_41
Publisher Name: Springer, Berlin, Heidelberg
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