Abstract
In electron microscopy, specimens under examination are inevitably subjected to the deteriorating action of the electron beam and change more or less in shape, chemical composition, and crystal structure. Contamination of specimens is also a result of the joint action of electrons and residual organic vapours. These problems have often been discussed and will gain in importance as the high magnification electron microscope becomes more popular. One way to minimize the deterioration would be to take the micrographs with a minimum dose of electrons by eliminating the necessity of focusing.
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© 1960 Springer-Verlag Berlin Heidelberg
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Sasaki, N., Ueda, R., Arai, N. (1960). A protection shutter for the specimen in the electron microscope. In: Möllenstedt, G., Niehrs, H., Ruska, E. (eds) Physikalisch-Technischer Teil. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-50195-1_25
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DOI: https://doi.org/10.1007/978-3-642-50195-1_25
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-50196-8
Online ISBN: 978-3-642-50195-1
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