Abstract
Improved technologies for growing semiconductor thin films of different structural and electronic properties, and even with layer thickness approaching atomic dimensions, have provided new opportunities for basic scientific studies and device applications. New fabrication technologies have also made it possible to reduce device dimensions to the point where quantum size effects must be considered in order to realistically describe the device operation and reliably predict their performance for electronic and optical applications. In this chapter, we shall present a partial summary of advances in low-dimensional semiconductor materials and their device applications.
Keywords
- Metal Organic Chemical Vapor Deposition
- Quantized Energy Level
- Crystal Growth Technique
- CdSe Colloidal
- Minority Hole
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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Acknowledgements
This work was partially supported by the Scientific and Technical Research Council of Turkey (TÜBİTAK) under Grant No: TBAG-105T463. Two of us, H. H. Gürel and Ö. Akıncı, greatly acknowledge the Ph.D. student fellowships by Turkish State Planning Agency (DPT). The authors would like to greatly acknowledge the computer usage of High Performance Computing Laboratory of Informatics Institute at istanbul Technical University.
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Ünlü, H., Karim, M.R., Gürel, H.H., Akıncı, Ö. (2013). Advances in Low-Dimensional Semiconductor Structures. In: Ünlü, H., Horing, N. (eds) Low Dimensional Semiconductor Structures. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-28424-3_1
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