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A Study on the Electrical Properties of the BaTiO3 Ceramic Thin Films

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Grid and Distributed Computing (GDC 2011)

Part of the book series: Communications in Computer and Information Science ((CCIS,volume 261))

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Abstract

Polycrystalline BaTiO3 thin films have been prepared on slid grass substrate by RF/DC magnetron sputtering equipment. The films were deposited at evoporator system and were annealed at heattreatment. The films had a dense microstruture with fine grains. The electrical properties of the films were dramatically controlled with annealing. Samples Preparation were analyzed in term of PTCR(positive temperature coefficient of Resistivity) Samples were made in the substrate tempera-true of 400°C deposition time of 10 hours,and forward power of 210watt. R-T(resistivity-tempera-true) Characteristics of the samples were investigated as a function of the substrate type and the ambient temperature. The resistivity of the thin film specimens was compared with that of the bulk type specimens. By using RF/DC magnetron sputtering system, we obtained lower resistivity in the thermistor with thin BaTiO3 film than that in the bulk type thermistor.

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© 2011 Springer-Verlag Berlin Heidelberg

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Im, IT., Jo, H.S., Oh, S.H., So, B.M. (2011). A Study on the Electrical Properties of the BaTiO3 Ceramic Thin Films. In: Kim, Th., et al. Grid and Distributed Computing. GDC 2011. Communications in Computer and Information Science, vol 261. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-27180-9_44

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  • DOI: https://doi.org/10.1007/978-3-642-27180-9_44

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-27179-3

  • Online ISBN: 978-3-642-27180-9

  • eBook Packages: Computer ScienceComputer Science (R0)

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