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Evaluation of the Nanoimprinting Process Using Scanning Probe Microscopy (SPM)

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Scanning Probe Microscopy in Nanoscience and Nanotechnology 3

Part of the book series: NanoScience and Technology ((NANO))

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Abstract

Nanoimprint lithography (NIL) is a technology that allows the fabrication of low-cost nanostructure devices at high throughput and accuracy. The most popular NIL method is ultraviolet (UV) nanoimprinting because it is a room-temperature process that does not require a thermal cycle. When demolding, the force required is the result of adhesion and friction between the antisticking layer and the resin, and a high demolding force produces pattern defects. Scanning probe microscopy (SPM) is a useful technique for evaluating the performance at the nanometer scale of both the antisticking layer and the UV-curable resin. In this chapter, we describe the evaluation, using techniques of scanning probe microscopy, of a number of properties of antisticking layers and UV-curable resins used in nanoimprint lithography.

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Author information

Authors and Affiliations

  1. Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Koto, Kamigori, Ako, Hyogo, Japan

    Makoto Okada

  2. Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Ako, Hyogo, Japan

    Shinji Matsui

Authors
  1. Makoto Okada
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  2. Shinji Matsui
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Editor information

Editors and Affiliations

  1. , Nanoprobe Laboratory for Bio- &, Ohio State University, West 19th Avenue 201, Columbus, 43210-1142, Ohio, USA

    Bharat Bhushan

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Okada, M., Matsui, S. (2012). Evaluation of the Nanoimprinting Process Using Scanning Probe Microscopy (SPM). In: Bhushan, B. (eds) Scanning Probe Microscopy in Nanoscience and Nanotechnology 3. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-25414-7_18

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