Abstract
International SEMATECH has selected Extreme Ultraviolet (EUV) lithography as the leading technology candidate for sub 50 nm integrated circuits. Major programs supporting EUV lithography now exist in the U.S., Europe, and Japan, pushing the development of the global infrastructure needed for commercialization by the end of this decade. This promotes the development of technologies using Extreme ultraviolet radiation by making all needed components like optical elements, filters, detectors and sources available.
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© 2004 Springer-Verlag Berlin Heidelberg
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Lebert, R. et al. (2004). Compact Laboratory EUV-Lamps: “In-House Beamlines” for Technologies Based on Extreme Ultraviolet Radiation. In: Knobloch, H., Kaminorz, Y. (eds) MicroNano Integration. VDI-Buch. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-18727-8_36
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DOI: https://doi.org/10.1007/978-3-642-18727-8_36
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