Multilayers and Multicomponents — Layers Produce in Atmosphere of Metalloorganic Compounds of Aluminum in Arc Plasma Discharge of Titanium — New Technology MO PVD-Arc

Abstract

Conventional deposition technologies like PA PVD-Arc use arc-discharge at low pressure. Examples are TiA1C, TiA1CN, TiA1N layers, produced by arc-discharge on an metallic electrode, in presence of a reactive gas atmosphere. Former researches have shown the possibility to produce films with carbides, nitrides and carbonitrides from metalloorganic compounds by PA PVD-Arc technology. Our investigations show, that the content of Al in formation phases dependend on partial pressure and stoichiometry of the metalloorganic atmosphere. Metalorganic agent permit the formation of layers of diferent stoichiometry of metallic elements in cycle technology. In this work we analyzed Ti_xAl_yN, Ti_xAl_yC, Ti_xAl_yCN multilayers.

Aim of our investigations was the creation of multiple coatings of metal organic compounds, containing Al. The creation of layers was performed by chemical reaction in plasma arcs, generated at an titanium electrode, at a current of 80 A. A reactive gas atmosphere was introduced into the area of Ti ions. Figure 1 gives a schematic view of the MO PVD-Arc system.