Abstract
Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD) are both processes currently used to manufacture thin-film coatings for various applications in the fields of Micro-Electro-Mechanical Systems (MEMS), NanoElectro-Mechanical Systems (NEMS), microelectronics, biomedical and optical devices, or common machining tools.
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Evanno, N.M.P., Mendels, D.A. (2004). Four Point Bending Test of Thin Films in the nm Through to μm Range. In: Knobloch, H., Kaminorz, Y. (eds) MicroNano Integration. VDI-Buch. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-18727-8_24
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DOI: https://doi.org/10.1007/978-3-642-18727-8_24
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