Abstract
Both, microscopic and analytic techniques using light (IR, VIS, UV) or X-rays reach their limits when dealing with mesoscopic or nano-scale samples. Conventional instrumentation for nanotechnology do the jobs as long as surface properties or thin layers are investigated, but lack of sufficient penetration and/or resolution when bulk properties of the samples become relevant.
Using photons, only the Extreme Ultraviolet (XUV) spectral range comprising EUV, soft-X-rays, VUV offers an outstanding combination of features needed for structuring and analyzing of matter on the 10 to 1000 nm lateral and vertical scale: XUV-radiation is traditionally exploited at beamlines at large storage-ring facilities like BESSY II. The fact that the roadmap of the semiconductor industry drives the development of the basic components required, allows to disseminate EUV-technology to laboratories for nanosciences and nanotechnology.
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Lebert, R. et al. (2004). Extreme Ultraviolet Radiation from Pulsed Discharges:A New Access to “Nanoscopy” and “Nanolytics”. In: Knobloch, H., Kaminorz, Y. (eds) MicroNano Integration. VDI-Buch. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-18727-8_23
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DOI: https://doi.org/10.1007/978-3-642-18727-8_23
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