Abstract
The International Technology Roadmap for Semiconductors (ITRS) lays out a quite challenging path for the further development of the patterning techniques needed to create the ever-smaller feature sizes. In recent years the standard lithography repeatedly reached its limits due to the diffraction effects encountered with continuously shrinking mask patterns. These restrictions on wavelength, in combination with high process and equipment costs, make low cost, simple imprinting techniques competitive with next generation lithography methods. There are no physical limitations encountered with imprinting techniques for much smaller, fully replicated structures, down to the sub-10 nm range.
This is a preview of subscription content, log in via an institution.
Buying options
Tax calculation will be finalised at checkout
Purchases are for personal use only
Learn about institutional subscriptionsPreview
Unable to display preview. Download preview PDF.
References
Stephen C. Jakeway, H. John Crabtree, Tèodor Veres, Neil S. Cameron, Helge Luesebrink, Thomas Glinsner, “Transition of MEMS Technology to Nanofabrication”, ICMENS 2003 — The 2003 International Conference on MEMS, NANO, and Smart Systems.
Nils Roos, Thomas Luxbacher, Thomas Glinsner, Karl Pfeiffer, Hubert Schulz, Hella-C. Scheer, “Nanoimprint Lithography with a Commerical 4 inch Bond System for Hot Embossing”, Proceedings of SPIE’s 26th Annual International Symposium Microlithography, Feb. 25 - March 2, 2001, Santa Clara, Vol. 434, 2001.
B. Vratzov, A. Fuchs M. Lemme, W. Heschel, H. Kurz, Large scale UV-based Nanoimprint Lithpgrahpy, 47th International Symposium on Electron, Ion, and Photon Beam Nanolithography, EIPBN 2003, Tampa, May 27 - May 30.
B. Michel, A. Bernard, A. Bietsch, E. Delamarche, M. Geissler, D. Junker, H. Kind, J.-R. Renault, H. Rothuizen, H. Schmid, R Schmidt-Winkel, R. Stutz, H. Wolf, “Printing meets Lithography: Soft approaches to high-resolution patterning”, J. Res. & Dev. Vol. 45, No. 5, September 2001.
H. Schift, L. J. Heyderman, M. Auf der Maur, J. Gobrecht, “Pattern formation in hot embossing of thin polymer films”, Institute of Physics Publishing, Nanotechnology 12 (2001), p. 173–177.
N. Roos, M. Wissen, T. Glinsner, H.-C. Scheer, “Impact of vacuum environment on the hot embossing process”, SPIE Microlithography 2003, Santa Clara.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2004 Springer-Verlag Berlin Heidelberg
About this paper
Cite this paper
Eichinger-Heue, R. et al. (2004). Nanoimprinting — a Key Enabling Technology for BioM EMS and Biomedical Applications. In: Knobloch, H., Kaminorz, Y. (eds) MicroNano Integration. VDI-Buch. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-18727-8_19
Download citation
DOI: https://doi.org/10.1007/978-3-642-18727-8_19
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-62265-6
Online ISBN: 978-3-642-18727-8
eBook Packages: Springer Book Archive