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CVD of Silica for the Shape Selective Reaction

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Characterization and Design of Zeolite Catalysts

Part of the book series: Springer Series in Materials Science ((SSMATERIALS,volume 141))

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Abstract

Chemical vapor deposition (CVD) of silicon alkoxide on the external surface of zeolite is proposed to realize the shape selective reaction and adsorption. Formation, characterization and control function of the silica overlayer on zeolites, mordenite, ZSM-5, A, and Y-zeolites are elucidated. The fine control of the pore-opening size of zeolite is an example of the molecular engineering of zeolites.

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Authors and Affiliations

  1. Graduate School of Engineering Dept. Chemistry & Biotechnology, Tottori University, Koyama-Minami 4-101, 680-8552, Tottori, Japan

    Prof. Miki Niwa, Prof. Naonobu Katada & Prof. Kazu Okumura

Authors
  1. Prof. Miki Niwa
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  2. Prof. Naonobu Katada
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  3. Prof. Kazu Okumura
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Correspondence to Miki Niwa .

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Niwa, M., Katada, N., Okumura, K. (2010). CVD of Silica for the Shape Selective Reaction. In: Characterization and Design of Zeolite Catalysts. Springer Series in Materials Science, vol 141. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-12620-8_6

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  • DOI: https://doi.org/10.1007/978-3-642-12620-8_6

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-12619-2

  • Online ISBN: 978-3-642-12620-8

  • eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)

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