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A Novel Approach for Oxide Scale Growth Characterization: Combining Etching with Atomic Force Microscopy

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Scanning Probe Microscopy in Nanoscience and Nanotechnology 2

Part of the book series: NanoScience and Technology ((NANO))

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Abstract

The combination of atomic force microscopy (AFM) analysis of oxide scales before and after chemical etching is presented as a fast, powerful method to gain information on oxide scale growth kinetics. While not limited to the field of ceramics, we chose the thermal oxidation of silicon carbide at high temperatures (1, 400 ∘ C) as an example for the potential of the AFM/etching method. SiC is a promising semiconductor material with many high-temperature applications during which not only simple oxidation, but also crystallization of the initially vitreous silica scale occurs. We demonstrate how AFM/etching analysis of crystalline areas (radialites) yields valuable information on the growth rate of the crystalline and amorphous silica scale. This can be directly translated into a statement on the oxidation passivation potential of a certain oxide scale state/morphology with important consequences for the actual high-temperature application. Also, the influence of impurities is addressed as this is an essential aspect for real-world application of silicon carbide (both, as a refractory and ceramic material).

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Acknowledgements

V.P. gratefully acknowledges the financial support of the Alexander-von-Humboldt-Foundation (Feodor-Lynen scholarship). Dr. Richard Wirth is thanked for his kind help with the HR-TEM analyses. Dipl.-Min. Yannick Hemberger kindly assisted with the AFM measurements.

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Authors and Affiliations

  1. Nano Materials Group, Drexel University, PA 134, Philadelphia, USA

    V. Presser

  2. Eberhard Karls Universität Tübingen Institute for Geosciences, Wilhelmstraße 56, D-72074, Tübingen, Germany

    A. Loges & K. G. Nickel

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  1. V. Presser
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  2. A. Loges
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  3. K. G. Nickel
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Correspondence to V. Presser .

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  1. Nanoprobe Lab. Bio- & Nanotechnology &, Biomimetics (NLB²), Ohio State University, West 19th Avenue 201, Columbus, 43210-1142, Ohio, USA

    Bharat Bhushan

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Presser, V., Loges, A., Nickel, K.G. (2011). A Novel Approach for Oxide Scale Growth Characterization: Combining Etching with Atomic Force Microscopy. In: Bhushan, B. (eds) Scanning Probe Microscopy in Nanoscience and Nanotechnology 2. NanoScience and Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-10497-8_12

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