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Physical Basics of Modern Methods of Surface and Thin Film Analysis

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Handbook of Thin-Film Technology

Abstract

The characterization of surfaces contains the identification of the atoms existing at the surface, their classification in crystalline or amorphous structure, the chemical bonding, and the electronic structure of the surface. By means of this knowledge we can determine further characteristics, such as dynamic, electrical, thermal, and chemical properties, etc. With the analysis methods discussed in this chapter, the atoms and molecules at the surface are identified due to their mass or their characteristic electronic energy states. The method of the diffraction of electrons (low energy electron diffraction LEED, reflection high energy electron diffraction RHEED) uses the periodic arrangement from surface atoms to the determination of the crystalline structure. The investigation of the electron work function also uses a collective characteristic, the potential jump at the surface.

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Authors
  1. Hartmut Frey Prof. Dr.
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Editors and Affiliations

  1. Esslingen, Germany

    Hartmut Frey Prof. Dr.

  2. Schwäbisch Gmünd, Germany

    Hamid R. Khan Prof. Dr.

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Frey, H. (2015). Physical Basics of Modern Methods of Surface and Thin Film Analysis. In: Frey, H., Khan, H.R. (eds) Handbook of Thin-Film Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-05430-3_10

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