Abstract
Pattern formation by low-energy ion beams results from a balance among different kinetic processes on the surface. Some increase the roughness of the surface (e.g., sputtering) while others tend to smoothen the surface (e.g., diffusion) and the interaction between them leads to the development of a characteristic periodicity on the surface. In this chapter, we describe the different physical mechanisms that contribute to sputter ripple formation and their dependence on the processing parameters of flux and temperature. This is used to develop a linear instability model that can be applied to understanding the different features of patterning that are found under different processing conditions.
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Chason, E., Chan, W.L. (2009). Spontaneous Patterning of Surfaces by Low-Energy Ion Beams. In: Bernas, H. (eds) Materials Science with Ion Beams. Topics in Applied Physics, vol 116. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-88789-8_3
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