Skip to main content

A Study on Patent Compulsory License System in China – With Particular Reference to the Drafted 3rd Amendment to the Patent Law of the P.R. of China

  • Chapter
Patents and Technological Progress in a Globalized World

Part of the book series: MPI Studies on Intellectual Property, Competition and Tax Law ((MSIP,volume 6))

The patent compulsory licensing system has always been a very controversial topic in intellectual property law, in particular for developing countries around the world. The TRIPS Agreement signed in 1994 did not stop these disputes; instead, due to the complication of the relationship between the TRIPS Agreement and the Paris Convention, patent compulsory licensing has become even more complica-ted. Although China has not issued any compulsory licenses, as this system involved numerous interests in the ongoing 3rd revision on the Patent Law, the patent compulsory licensing has become a focus to all.

Being involved in the legislative revision process of the Patent Law of the P.R. of China, I would like to explore the key issues on the patent compulsory licensing system from the perspective of China's law.

This paper will proceed as follows: firstly, it will discuss the meaning of ‘Failure to Work or Insufficient Working’ under the framework of TRIPS; secondly, it will explore whether the granting of a compulsory license is based on the refusal of the patent holder; thirdly, the paper will examine the relationship between compulsory license and anti-competition; and fourthly, it will cover the compulsory license for public health.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 169.00
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

Author information

Authors and Affiliations

Authors

Editor information

Editors and Affiliations

Rights and permissions

Reprints and permissions

Copyright information

© 2009 Springer-Verlag Berlin Heidelberg

About this chapter

Cite this chapter

Liu, X. (2009). A Study on Patent Compulsory License System in China – With Particular Reference to the Drafted 3rd Amendment to the Patent Law of the P.R. of China. In: Pyrmont, W.P.z.W.u., Adelman, M.J., Brauneis, R., Drexl, J., Nack, R. (eds) Patents and Technological Progress in a Globalized World. MPI Studies on Intellectual Property, Competition and Tax Law, vol 6. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-88743-0_10

Download citation

Publish with us

Policies and ethics