First, we discuss the composition of the plasma bulk from a chemical point of view. What are the species that are generated by the different excitation methods? Does the surface (substrate electrode and reactor walls) influence the composition of the plasma bulk? Some important mechanisms, i. e. the kinetics of a reaction, will be discussed in detail.
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© 2009 Springer-Verlag Berlin Heidelberg
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Franz, G. (2009). Etch Mechanisms. In: Low Pressure Plasmas and Microstructuring Technology. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-85849-2_12
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DOI: https://doi.org/10.1007/978-3-540-85849-2_12
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Online ISBN: 978-3-540-85849-2
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