Micro-Structuring and Ferroelectric Domain Engineering of Single Crystal Lithium Niobate

Abstract

The ability to microstructure specific materials is always associated with the ability to selectively remove material over small scale-lengths. Localized etching whether it is chemical or physical, wet or dry, parallel or sequential is central to every modern microstructuring method. For example a beam of accelerated ions is scanned on the surface of interest removing material along its trajectory. Alternatively the surface is prepared/treated in a manner that changes its “quality” locally making it more susceptible or more resistive to a particular etching agent. The whole surface is subsequently exposed to the etching agent which can be a uniform accelerated ion beam, a laser beam or an acid. The etching agent preferentially attacks the pre-treated (or the untreated) portion of the surface removing material.