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Ion Beam Devices for Material Processing and Analysis

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Authors
  1. F. Rüdenauer
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  2. H. W. P. Koops
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  3. G. Hobler
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  4. L. Palmetshofer
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  5. H. Bluhm
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Editors and Affiliations

  1. Lehrstuhl für Technische Elektronik, TU München, Arcisstr. 21, 80290, München, Germany

    Joseph A. Eichmeier

  2. Institut für Hochleistungsimpuls- und Mikrowellentechnik, Forschungszentrum Karlsruhe, Postfach 3640, 76021, Karlsruhe, Germany

    Manfred K. Thumm

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Rüdenauer, F., Koops, H.W.P., Hobler, G., Palmetshofer, L., Bluhm, H. (2008). Ion Beam Devices for Material Processing and Analysis. In: Eichmeier, J.A., Thumm, M.K. (eds) Vacuum Electronics. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-71929-8_5

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