Abstract
The application of sputtered sliced zone plates [1] to high resolution X-ray microscopy is discussed. A sputtering apparatus producing the thin layers needed for the construction of the zone plates is presented and a sample with 50 nm structure width is shown. The selective removal of one of the two constituent materials is demonstrated. The resulting free standing structures have zone widths of 50 nm and are 200 nm high.
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References
D. Rudolph et al., Status of the Sputtered Sliced Zone Plates for X-ray Microscopy, SPIE-Proc. Vol. 316, E. Spiller (ed.), (1981), 103–105
J. Kirz, Phase Zone Plates for X-rays and the extreme UV, J. Opt. Soc. Am., 64, 301–309, (1974)
R. Hilkenbach et al., Phase Zone Plates for the Göttingen X-ray Microscopes, in: X-ray Microscopy II, D. Sayre et al. (eds.), Springer Series in Optical Sciences 56, 95–101 ( Springer-Verlag, Berlin, Heidelberg 1988 )
J. Thieme, Theoretical Investigations of Imaging Properties of Zone Plates Using Diffraction Theory, ibid., 70–79 ( Springer-Verlag, Berlin, Heidelberg 1988 )
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© 1992 Springer-Verlag Berlin Heidelberg
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Hilkenbach, R. (1992). Experiments for the Construction of Sputtered Sliced Zone Plates. In: Michette, A.G., Morrison, G.R., Buckley, C.J. (eds) X-Ray Microscopy III. Springer Series in Optical Sciences, vol 67. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-46887-5_19
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DOI: https://doi.org/10.1007/978-3-540-46887-5_19
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-662-13894-6
Online ISBN: 978-3-540-46887-5
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