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Electron Holography

  • Akira Tonomura
Chapter
Part of the Springer Series in Optical Sciences book series (SSOS, volume 70)

Abstract

This chapter introduces typical examples for the electron holography techniques that have hitherto been developed.

Keywords

Spherical Aberration Object Wave Electron Holography Carrier Fringe Conjugate Image 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 5.1
    L. Reimer: Transmission Electron Microscopy, 4th edn., Springer Ser. Opt. Sci., Vol. 36 ( Springer, Berlin, Heidelberg 1997 )CrossRefGoogle Scholar
  2. 5.2
    G. Möllenstedt, H. DU ker: Beobachtung and Messungen an Biprisma-Interferenzen mit Elektronen Wellen. Z. Phys. 145, 377 (1956)ADSCrossRefGoogle Scholar
  3. 5.3
    A. Tonomura: Optimum design of accelerating electrodes for a field emission electron gun. Jpn. J. Appl. Phys. 12, 1065 (1973)ADSCrossRefGoogle Scholar
  4. 5.4
    K. Matsumoto, M. Takahashi: Phase-difference amplification by nonlinear holograms. J. Opt. Soc. Am. 60, 30 (1970)ADSCrossRefGoogle Scholar
  5. 5.5
    J. Endo, T. Matsuda, A. Tonomura: Interference electron microscopy by means of holography. Jpn. J. Appl. Phys. 18, 2291 (1979)Google Scholar
  6. 5.6
    J. Endo, T. Kawasaki, T. Osakabe, A. Tonomura: Sensitivity improvement in electron-holographic interferometry. Proc. 13th Int’I Commission for Optics (Sapporo 1984), ed. by H. Ohzu ( Organizing Committee, Sapporo 1984 ) pp. 480–481Google Scholar
  7. 5.7
    A. Tonomura, T. Matsuda, T. Kawasaki, J. Endo, N. Osakabe: Sensitivity-enhanced electron-holographic interferometry and thickness-measurement applications at atomic scale, Phys. Rev. Lett. 54, 60 (1985)ADSCrossRefGoogle Scholar
  8. 5.8
    H.I. Bjelkhagen: Silver Halide Recording Materials and Their Processing, Springer Ser. Opt. Sci., Vol. 66 ( Springer, Berlin, Heidelberg 1993 )Google Scholar
  9. 5.9
    M. Takeda, H. Ina, S. Kobayashi: Fourier-transform method of fringe pattern analysis for computer-based holography and interferometry. J. Opt. Soc. Am. 72, 156 (1982)ADSCrossRefGoogle Scholar
  10. 5.10
    M. Takeda, Q. Ru: Computer-based highly sensitive electron-wave interferometry. Appl. Opt. 24, 3068 (1985)ADSCrossRefGoogle Scholar
  11. 5.11
    J.H. Bruning: Fringe scanning interferometers, in Optical Shop Testing, ed. by D. Malacara ( Wiley, New York 1978 ) pp. 409–437Google Scholar
  12. 5.12
    T. Yatagai, K. Ohmura, S. Iwasaki, S. Hasegawa, J. Endo. A. Tonomura: Quantitative phase analysis in electron holographic interferometry. Appl. Opt. 26, 377 (1987)ADSCrossRefGoogle Scholar
  13. 5.13
    S. Hasegawa, T. Kawasaki, J. Endo, A. Tonomura: Sensitivity-enhanced electron holography and its application to magnetic recording investigations. J. Appl. Phys. 65, 2000 (1989)Google Scholar
  14. 5.14
    Q. Ru, J. Endo, T. Tanji, A. Tonomura: Phase-shifting electron holography by beam tilting. Appl. Phys. Lett. 59, 2372 (1991)ADSCrossRefGoogle Scholar
  15. 5.15
    G. Lai, T. Hirayama, K. Ishizuka, T. Tanji, Tonomura: Three-dimensional reconstruction of electric-potential distribution in electron-holographic interferometry. Appl. Opt. 33, 829 (1994)ADSCrossRefGoogle Scholar
  16. 5.16
    G. Lai, T. Hirayama, A. Fukuhara, K. Ishizuka, T. Tanji, A. Tonomura: Three-dimensional reconstruction of magnetic vector fields using electron-holographic interferometry. J. Appl. Phys. 75, 4593 (1994)ADSCrossRefGoogle Scholar
  17. 5.17
    J. Chen, T. Hirayama, G. Lai, T. Tanji, K. Ishizuka, A. Tonomura: Real-time electron-holographic interference microscopy with a liquid-crystal spatial light modulator. Opt. Lett. 18, 1887 (1993)ADSCrossRefGoogle Scholar
  18. 5.18
    J. Chen, G. Lai, K. Ishizuka, A. Tonomura: Method of compensating for aberrations in electron holography by using a liquid-crystal spatial-light modulator. Appl. Opt. 33, 1187 (1994)ADSCrossRefGoogle Scholar
  19. 5.19
    O. Scherzer: The theoretical resolution limit of the electron microscopy. J. Appl. Phys. 20, 20 (1949)Google Scholar
  20. 5.20
    G. Saxon: The compensation of magnetic lens wavefront aberrations in side-band holography with electrons. Optik 35, 359 (1972)Google Scholar
  21. 5.21
    A. Tonomura, T. Matsuda, J. Endo: Spherical-aberration correction of electron lens by holography. Jpn. J. Appl. Phys. 18, 1373 (1979)ADSCrossRefGoogle Scholar
  22. 5.22
    D. Gabor: Microscopy by reconstructed wavefronts. Proc. Roy. Soc. London A 197, 454 (1949)ADSzbMATHCrossRefGoogle Scholar
  23. 5.23
    I. Weingärtner, W. Mirandé, E. Menzel: Enhancement of resolution in electron microscopy. Optik 30, 318 (1969)Google Scholar
  24. 5.24
    M. Haider, S. Uhlemann, E. Schwan, H. Rose, B. Kabius, K. Urban: Electron microscopy image enhanced. Nature 392, 768 (28 April 1998 )Google Scholar
  25. 5.25
    A. Tonomura, T. Matsuda: A new method for micro-area electron diffraction by electron holography. Jpn. Appl. Phys. 19, L97 (1980)ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 1999

Authors and Affiliations

  • Akira Tonomura
    • 1
  1. 1.Advanced Research LaboratoryHitachi, Ltd.SaitamaJapan

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