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Characterisation and Monitoring

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Optical Interference Coatings

Part of the book series: Springer Series in Optical Sciences ((SSOS,volume 88))

Abstract

In the course of the rapid development of new laser systems and modern optics, optical coating technology is challenged by ever increasing quality requirements. For example, many of current laser applications in material processing, medicine, or fundamental research are dependent on optical components with low losses, high laser induced damage thresholds, and a high stability in respect to environmental influences. Besides innovative applications of fs-lasers, semiconductor lithography can be considered as one of the major pace makers for optical thin film technology which pushes the wavelength to lower limits in the UV/VUV- and even the EUV-spectral range and defines new specifications in respect to life time and contamination of optical coatings. Not least, complex spectral transfer functions have to be fulfilled by optical coatings in the emerging fields of telecommunication and applications of modern optics in precision metrology.

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Author information

Authors and Affiliations

  1. Laser Zentrum Hannover, Germany

    Detlev Ristau

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  1. Detlev Ristau
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Editors and Affiliations

  1. Fraunhofer-Institut, Angewandte Optik Feinmechanik, Winzerlaer Strasse 10, 07745, Jena, Germany

    Norbert Kaiser

  2. Institut für Ionenphysik, Universität Innbruck, Technikerstrasse 25, 6020, Innbruck, Austria

    Hans K. Pulker

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© 2003 Springer-Verlag Berlin Heidelberg

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Ristau, D. (2003). Characterisation and Monitoring. In: Kaiser, N., Pulker, H.K. (eds) Optical Interference Coatings. Springer Series in Optical Sciences, vol 88. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-36386-6_8

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  • DOI: https://doi.org/10.1007/978-3-540-36386-6_8

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-05570-6

  • Online ISBN: 978-3-540-36386-6

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