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Optical Coatings for the DUV / VUV

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Optical Interference Coatings

Part of the book series: Springer Series in Optical Sciences ((SSOS,volume 88))

Abstract

During the last two decades, the development of powerful UV light sources, especially excimer lasers and frequency multiplied solid state lasers has lead to growing research efforts in the field of UV photon application. One of the main drivers toward the shortest possible wavelengths in the vacuum ultraviolet spectral region is semiconductor manufacturing. To produce integrated circuits with higher integration, lower power consumption and lower costs optical lithography using excimer laser based reduction wafer steppers is one of the key technologies for generation of the smallest lateral dimensions down to 0.1 µm and below (Rothschild and Ehrlich 1988, Rothschild et al. 1997, Rothschild 1998).

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  1. Southwall Europe GmbH, Grossroehrsdorf, Germany

    Roland Thielsch

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  1. Roland Thielsch
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  1. Fraunhofer-Institut, Angewandte Optik Feinmechanik, Winzerlaer Strasse 10, 07745, Jena, Germany

    Norbert Kaiser

  2. Institut für Ionenphysik, Universität Innbruck, Technikerstrasse 25, 6020, Innbruck, Austria

    Hans K. Pulker

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Thielsch, R. (2003). Optical Coatings for the DUV / VUV. In: Kaiser, N., Pulker, H.K. (eds) Optical Interference Coatings. Springer Series in Optical Sciences, vol 88. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-36386-6_11

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  • DOI: https://doi.org/10.1007/978-3-540-36386-6_11

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