Abstract
The potential of rare gas halide lasers for efficient, high-power generation in the near ultraviolet is well recognized. These devices typically have been operated at very low pulse repetition rates, however, which has limited their average power and general utility. In this study we have investigated problems associated with high-repetition-rate operation of a rare gas halide device and have successfully constructed a discharge-excited XeF laser capable of operating at pulse repetition rates extending to 200 Hz.
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References
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© 1978 Springer-Verlag Berlin Heidelberg
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Christensen, C.P. (1978). High Repetition Rate XeF Laser with Gas Recycling. In: Kompa, K.L., Walther, H. (eds) High-Power Lasers and Applications. Springer Series in Optical Sciences, vol 9. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-35942-5_6
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DOI: https://doi.org/10.1007/978-3-540-35942-5_6
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-662-15400-7
Online ISBN: 978-3-540-35942-5
eBook Packages: Springer Book Archive