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Physics of Ferroelectric Interfaces: An Attempt at Nanoferroelectric Physics

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Ferroelectric Thin Films

Part of the book series: Topics in Applied Physics ((TAP,volume 98))

Abstract

Experiments on devices can be regarded as part of basic physics. Here, theoretical analyses of devices using the interface in a ferroelectric junction reveal novel basic properties unknown in conventional experiments. Devices using interfaces in ferroelectric junctions are grouped into two types: (1) the lateral-type, or field-effect, devices that use the transconductance, i.e., the conduction parallel to the interface; and (2) the vertical-type, or diode-like, devices, in which the conduction is perpendicular to the interface and the current flows through the ferroelectric. The discussion below concentrates on the field-effect type (1). On the other hand, the other type of devices  have recently attracted intense interest due to the resistance RAM (R-RAM). Additionally, modulation of the tunneling current and the photovoltaic effect have been demonstrated . Details of these topics will be discussed elsewhere. We start our journey by assuming for the present that the ferroelectric is an ideal insulator.

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Masanori Professor Okuyama Yoshihiro Ishibashi

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Watanabe, Y. Physics of Ferroelectric Interfaces: An Attempt at Nanoferroelectric Physics. In: Professor Okuyama, M., Ishibashi, Y. (eds) Ferroelectric Thin Films. Topics in Applied Physics, vol 98. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-31479-0_10

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  • DOI: https://doi.org/10.1007/978-3-540-31479-0_10

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-24163-8

  • Online ISBN: 978-3-540-31479-0

  • eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)

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