Abstract
Photoelastic fringe pattern for stress analysis is investigated by computer simulation. The first simulation is to separate isoclinics and isochromatics from photoelastic fringes of a circular disk under diametric compression by use of phase shift method. The second one is an analysis of photoelastic fringe patterns on perforated tensile plate with conformal mapping and measured data. The results of both simulations agree well with those of optical experiments.
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Baek, T.H., Kim, M.S. (2005). Computer Simulation of Photoelastic Fringe Patterns for Stress Analysis. In: Baik, DK. (eds) Systems Modeling and Simulation: Theory and Applications. AsiaSim 2004. Lecture Notes in Computer Science(), vol 3398. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-30585-9_24
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DOI: https://doi.org/10.1007/978-3-540-30585-9_24
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-540-24477-6
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