Photonic Microsystems from LIGA Technology

Part of the TEUBNER-TEXTE zur Physik book series (TTZP)


Due to its almost complete freedom in lateral structuring, to the large choice of materials, and to the cheap mass production feature, LIGA technology offers new possibilities to realise photonic microsystems, either integrated or microoptical. In particular, advantages can be expected with respect to systems combining optically nonlinear with linear materials and concerning flux and flux density of the optical energy flow. It is found that the optical Kerr coefficient n2 of an interesting nonlinear material must exceed a lower limit, i.e., n2 > (λΔø/2πI0)α , in order to be useful for photonic microsystems. Herein, X is the wavelength, Δø/2π the phase shift caused by the nonlinear part of the microsystem, I0 the energy flux density of the incident light, and a the absorption coefficient of the nonlinear material. Bubeck and coworkers have given relationships between a and n2 for a variety of organic materials. In case of a recently described phthalocyaninatoruthenium complex the optical Kerr coefficient and the 3rd order susceptibility should satisfy n2 > 4·10−14 m2/W and x(3) > 4·10−8 esu, respectively, at λ = 680 nm, Δø/2π = 0.01, and I0 = 100 MW/cm2 . This material comes close to these requirements.


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  1. AND 90.
    B. Anderer, KfK 4702, Kernforschungszentrum Karlsruhe, 1990.Google Scholar
  2. BEC 86.
    E.W. Becker, W. Ehrfeld, P. Hagmann, A. Maner, D. Münchmeyer, Microelectronic Engineering 4(1986)35.CrossRefGoogle Scholar
  3. BUB 90.
    C. Bubeck et al., . Makromol. Chem., Makromol. Symp. 37(1990)239.CrossRefGoogle Scholar
  4. BUB 91.
    C. Bubeck et al., Chem. Phys. 154(1991)343.CrossRefGoogle Scholar
  5. BUT 90.
    P.N. Butcher, D. Cotter, The Elements of Nonlinear Optics, Cambridge University Press, 1990, pp. 306.CrossRefGoogle Scholar
  6. DES 92.
    E. Desurvire, Scientific American, Jan. 1992, pp. 96.Google Scholar
  7. EAT 91.
    D.F. Eaton, Science 253(1991)281.CrossRefGoogle Scholar
  8. EHR 91.
    W. Ehrfeld, D. Münchmeyer, Nucl. Inst. and Meth. A303(1991)523Google Scholar
  9. ETE 91.
    S. Etemad et al., in “Organic Molecules for Nonlinear Optics and Photonics”, pp. 489, J. Messier et al., eds,Kluwer 1991.Google Scholar
  10. FRI 88.
    S.R. Friberg et al., Opt. Lett. 13(1988)904.CrossRefGoogle Scholar
  11. GIB 85.
    H.M. Gibbs, Optical Bistability: Controlling Light with Light, Academic Press, Orlando, 1985, pp. 375.Google Scholar
  12. GRU 92.
    A. Grund et al., J. Phys. Chem., 1992, in press.Google Scholar
  13. HAG 89.
    P. Hagmann, W. Ehrfeld, Intern. Polymer Processing IV(1989)3, pp. 188.Google Scholar
  14. JAE 88.
    compare, e.g., D. Jäger, Laser und Optoelektronik 1(1988)46; H.-J. Eichler et al., ibid. pp. 59.Google Scholar
  15. KAL 89.
    A. Kaltbeitzel et al., in “Electronic Properties of Conjugated Polymers III”, Springer Ser. in Sol. St. Sc. Vol. 91, pp. 220, H. Kuzmany et al., eds., Springer 1989.Google Scholar
  16. KEI 92.
    N. Keil, these proceedings.Google Scholar
  17. KNO 91.
    K. Knop, Phys. Bl. 47(1991)901.CrossRefGoogle Scholar
  18. MIT 90.
    F. Mitschke, Phys. Blätter 46(1990)463.CrossRefGoogle Scholar
  19. MOH 91.
    J. Mohr, J. Göttert, C. Müller, P. Bley, KfK-Nachrichten 23(23)(1991)93.Google Scholar
  20. MOL 91.
    L.F. Mollenauer, J.P. Gordon, S.G. Evangelides, Laser Focus World 27(1991)159.Google Scholar
  21. NEH 90.
    D. Neher et al., Synthetic Metals 37(1990)249.Google Scholar
  22. PRA 91.
    P.N. Prasad, D.J. Williams, Introduction to Nonlinear Optical Effects in Molecules and Polymers, John Wiley, Sons, Inc., New York, 1991Google Scholar
  23. SCH 91.
    S. Schrader et al., Synth. Met. 41–43(1991)3223.Google Scholar
  24. SCH 91.
    H. Schmidt, M. Popall, SPIE Vol. 1328(1990)249.CrossRefGoogle Scholar
  25. SCH 91.
    J. Stamatoff et al., Die Angew. Makromol. Chemie 183(1990)151.Google Scholar
  26. STR 92.
    B. Strebel, these proceedings.Google Scholar

Copyright information

© B. G. Teubner Verlagsgesellschaft Leipzig 1993

Authors and Affiliations

  1. 1.IMM Institut für Mikrotechnik GmbHMainz 1Germany

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