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Process Simulation for the Semiconductor Industry

  • J. Lorenz
  • F. Durst
  • H. Ryssel
Part of the Notes on Numerical Fluid Mechanics (NNFM) book series (NONUFM, volume 48)

Summary

A brief overview of approaches used and problems encountered in the simulation of the semiconductor fabrication process steps ion implantation, diffusion, oxidation, and layer deposition is given. Some recent improvements obtained at Erlangen in the development of physical models are described. Problems occuring for two- and especially for three-dimensional simulations are outlined. Their relationships to high-performance computing are sketched, and approaches for their solution are developed. Model and program requirements are discussed from the viewpoint of the requirements of industrial application. Furthermore, the importance of equipment simulation is discussed and an example for this strongly developing field is given.

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Copyright information

© Friedr. Vieweg & Sohn Verlagsgesellschaft mbH, Braunschweig/Wiesbaden 1994

Authors and Affiliations

  • J. Lorenz
    • 1
    • 2
  • F. Durst
    • 1
    • 3
  • H. Ryssel
    • 1
    • 2
    • 4
  1. 1.Bayerischer Forschungsverbund für Technisch-Wissenschaftliches HochleistungsrechnenGermany
  2. 2.Bereich BauelementetechnologieFraunhofer-Institut für Integrierte SchaltungenErlangenGermany
  3. 3.Lehrstuhl für StrötmungsmechanikUniversität Erlangen-NürnbergErlangenGermany
  4. 4.Lehrstuhl für Elektronische BauelementeUniversität Erlangen-NürnbergErlangenGermany

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